Maskless Lithography Workshop

27-28 August 2001
Pasadena, California

(All presentations are in .PDF format)

• Welcome/Agenda/Outline
• A Brief Overview of SRC/DARPA’s University Research Initiative in Maskless Lithography (Semiconductor Research Corporation)
• Multi-ebeam Direct Write (ETEC)
• The Present Status of Canon’s ML2 Technology (Canon, Inc.)
• The Maskless Stepper; A Flashy New Tool (Micronic Laser Systems)
• Massively Parallel Direct Write E-Beam System (Emission Systems, LLC)
• Massively Parallel Digital Electrostatic E-Beam Array Lithography; Electron Source Technology and Massively Parallel Digital Electrostatic E-Beam Array Lithography (Oak Ridge National Laboratory)
• Maskless Lithography Data Issues: What's in a Mask? (Keith Standiford, Consulting Services)
• Critical Issues