Litho Forum
28-29 January 2004
Los Angeles, California
(All presentations and posters are in .PDF format)
Survey Results
Presentations
(Listed by Session Topic)
| 193 nm Immersion |
| |
Bill
Arnold, ASML |
| |
Burn Lin,
TSMC |
| |
Ralph Dammel,
Clariant |
| |
Hideo Hata,
Canon |
| |
Sochi Owa, Nikon |
| |
Mitsuro Sato,
TOK |
| |
| 157 nm |
| |
Jos Benchop,
ASML |
| |
Andrew Grenville,
ISMT/Intel |
| |
Konrad Knapp,
Schott Lithotec |
| |
Kurt Ronse,
IMEC |
| |
Takahashi,
Canon |
| |
Karen Turnquest,
ISMT/AMD |
| |
John Wiesner,
Nikon |
| |
Paul Zimmerman,
ISMT / Intel |
| |
| EUV |
| |
Bob Akins,
Cymer |
| |
Jos Benchop,
ASML |
| |
Malcom Gower,
Exitech |
| |
Kevin Kemp, ISMT/Motorola |
| |
Barry Lieberman,
Intel |
| |
Guido
Schriever, XTREME |
| |
Peter Silverman,
Intel |
| |
K. Ushida,
Nikon |
| |
| EPL |
| |
Masaki
Yamabe, Selete |
| |
O. Hagarekawa, Hoya |
| |
K. Suzuki, Nikon |
| |
Masaki Yamabe, Selete |
| |
M. Shoji, NCS |
| |
| Charged Particle Maskless |
| |
Brandstettter,
IMS |
| |
Pieter Kruit,
Mapper |
| |
Fabian Pease,
Stanford |
| |
Hans Pieffer,
Consultant |
| |
| Optical Maskless |
| |
Kevin
Cummings, Cummings |
| |
Bill
Oldham, University of California, Berkeley |
| |
| Nano Imprint |
| |
Chou, Princeton |
| |
Doug
Resnick, Motorola |
| |
SV
Sreenivasan, Molecular Imprints |
| |
Grant Willson,
UT |
| |
| Mask Magnification |
| |
Mask
Magnification, Scott Hector |
Posters
(Listed by Technology Focus)