[All linked files are .PDF format unless otherwise indicated]
| Attendance Roster | |
| Welcome & Introduction | |
| SEMI Required Meeting Elements | |
| Review of May 18th TFOF Documents at NA PIC Meeting | Long He |
| Minutes | |
| 2005 Standards for EUV MasksStandards for EUV Masks | Scott Hector, SEMATECH Freescale Assignee |
| SEMI PIC EUV Working Group Meeting Warm Up | Michael Lering, Infineon Technologies |
| ASML EUV Mask Protection and Carrier | Brian Blum, ASML |
| Entegris EUV Carrier Program | Stephen Sumner, Entegris |
| EUV Reticle Carrier Joint Proposal and Current Status of Canon and Nikon |
Michael Sogard, Nikon Research Corporation of America |
| Alcatel Advanced MaskCarrier and Interface System | C. Le Guet, Alcatel |
| EUV Mask Blank CleaningEUV Mask Blank Cleaning | Abbas Rastegar, SEMATECH |
| EUV Mask Multilayer Degradation: Five Lessons from EUV OpticsEUV Mask Multilayer Degradation | Ginger Edwards, SEMATECH Freescale Assignee |
Copyright 2008, SEMATECH Inc.
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