EUV Source Workshop
27 February 2005

(All files are in PDF format unless otherwise indicated)

Welcome and Introduction, Vivek Bakshi

Session I: Supplier Updates

• Source Status Requirements Update, Yutaka Watanabe

Supplier Updates:

• Cymer, Igor Fomenkov
• EUVA, Akira Endo
• EXULITE, Magali Davenet
• Philips Extreme, Joseph Pankert
• PLEX LLC, Malcom McGeoch
• PowerLase, Samir Ellwi
• Xtreme technologies, Uwe Stamm
   

Session II: Sn based EUV Sources

• Sn Plasma Measurements and Fundamental Data , Konstantin Koshelev
• Sn Delivery systems and Metrology, Guenther Derra
• Sn Delivery system in EUVA, Yusuke Teramoto
• Low Debris Sn Discharge Source, K-Ngo Leung
• Sn Debris Mitigation, Ahmed Hassanein
• Sn Debris Mitigation, Brian Jurczyk
• Sn Debris Mitigation, Martin Richardson
   

Session III : EUV Resist Performance

• EUV Resist Performance Trade-Offs, Kim Dean/Robert Brainard
• Stepper Manufacturer's perspective on the present status of resist performance and its effect on EUV source requirements:
  • Canon, Hajime Kanazawa
  • Nikon, Kazuya Ota
• Session Summary, Vivek Bakshi
   

Session IV: Collectors for Sn based EUV Sources (Panel Discussion)

• What are the technical limits of tin debris mitigation in LPP EUV Sources?, Martin Richardson
• Material's perspective on designing collector for Sn based EUV Sources - UIUC, Brian Jurczyk
• User's perspective on collector requirements for Sn based EUV Sources - Intel, Robert Bristol
• Manufacturer's perspective on designing collector for Sn based EUV Sources - Media-Lario, Giovanni Nocerino
   

Session V: EUV Source Metrology

• Intermediate Focus Metrology: Development Results, Thomas Missalla
• Intermediate Focus Metrology: Development Results, Leonid Schmaenok
• EUV Source Metrology Calibration, Steve Grantham
• EUV Source and Stepper Interface Requirements, David Brandt
   

Session VI: Cost of Ownership

• SEMATECH's COO Model, Phil Seidel
• Suppliers' perspective on Cost of Ownership of EUV Sources:
  • PowerLase, Samir Ellwi
  • EUVA, Masaki Yoshioka
• Stepper Manufacturers' perspective on Cost of Ownership of EUV Sources:
  • Canon, Yutaka Watanabe
  • ASML, Hans Meiling
  • Nikon, Kazuya Ota

Technology Status and Workshop Summary, Vivek Bakshi

Poster Session

Modeling:

• Development of the atomic model of Xe and Sn for the EUV sources
• Upgrade in the Modelling of the Non-equilibrium Plasmas in EUV Sources

DPP:

• The Micro Plasma Pulse discharge EUV source
• A Focused Electron Beam EUV source
• About One Possibility to Meet EUV HVM Lifetime Requirement with DPP Rotating Disc Electrodes Source
• Spectroscopic diagnostic of EUV radiating plasmas and optimization of EUVL sources

LPP:

• EUV Source Developments on Laser-Produced Plasmas using Xe Cryogenic Target and Li new Scheme Target
• Studies on cryogenic Xe and Li targets for LPP-EUV sourceEUV light source design by Li target LPP
• Properties of EUV and particle generations from laser-irradiated solid- and low-density tin targets
• Mass-limited and nanoporous tin oxide as a laser target to generate extreme ultraviolet
• EUV source parameters of the laser-produced tin-doped micro-plasma
• Estimations on High Energy Ions and Neutral Particles from Laser-produced Xe EUV Light Sources
• LPP architecture based on high average power gas laser for a commercial 115W EUV light source

Metrology:

• Instrumentation for 'at-wafer' metrology of EUV source and Intermediate Focus
• Evaluation of components and tools for pulsed EUV source radiometry
• Erosion & Degradation of EUVL Collector Mirrors Under Sn Bombardment
• DPP Modelling