EUV Source Workshop

22 February 2004
Santa Clara, CA

Agenda
Welcome and Introduction	Bakshi
Source Requirement	Watanabe
Cymer	Fomenkov
EUVA	Endo
EXULITE	Barthod
JMAR	Bloom
PLEX	McGeoch
Philips Extreme UV	Pankert
PowerLase	Ellwi
XTREME Technologies	Gabel
Status of Source Data	Gillaspy
Optics Contamination Workshop Summary	Edwards
EUV Source Metrology Roadmap	Schurmann
Condenser Lifetime Measurements	Kleinschmidt
Debris Identiy	Ruzic
Flying Circus 2 Status and Update	Loius
Consortium EUVA	Endo
MEDEA plus and More Moore	Ziener
International SEMATECH	Bakshi
Intel	Bristol
Conversion Efficiency of LPP EUV	Nishihara
LPP vs GDPP	Richardson
LPP vs GDPP	Gabel
High Power EUV Source Feasibility	Pankert-Fomenkov
Workshop Summary	Bakshi
Posters
Developments in EUVL Metrology	Grantham
Irradiation Stability	Scholze
Collector Optics for EUVL	Marczuk
Calibration at NIST	Bruineman
EUV Source Evaluation	Watanabe
Laser-induced EUV Source	Mann
Debris-free EUV Source	Egbert
Tool for Direct EUV Source Metrology	Shmaenok
Status of EUV Lamp Development	Lebert
Dependence of EUV Emission Charac	Mochizuki
Laser Heating	Milchberg
Ionization & Excitation Rate Calcs	Zakharov
Structure of Emission Spectrum	Nishikawa
Structure of Emission Spectrum	Sasaki
Spectroscopic Studies	Koay
Model Calculations	Al-Rabban
Model Benchmark Spectra	Aguilar
SOARING Micro Plasma Pulse Discharge	Choi
Sim of Discharge Prod Plasma	Hassanein
Plasma Facing Comp Modeling	Hassanein
Erosion of EUV Source Materials	Pomeroy
Debris Studies	Takenoshita
The Erosion of Materials	Anderson
Xenon Recirculation	Greenwood
ECR Sources	Leung