EUV Source Workshop

29 September 2003

Welcome and Introduction	Vivek Bakshi, ISMT
Source Requirements	ASML/H. Franken
SESSION I: Supplier presentations
Cymer	I. Fomenkov
EUVA	A. Endo
EXULITE	B. Fay
PLEX	M. McGough
Philips Extreme UV	J. Pankert
Powerlase	S. Ellwi
Xtreme Technologies	U. Stamm
SESSION II: Debris Mitigation
University of Illinois	D. Ruzic
Argonne National Lab	A. Hassanein
BREAKOUT SESSIONS
Alternative material – Sn? (starting remarks for breakthrough session)
A comparison of EUV sources for lithography based on Xe and Sn
EUV emission from Xe and Sn plasmas; comparison between experimental results and calculations
The case for tin as an EUV The case for tin as an EUV source source
Most Critical Tasks in Source Development today
Critical Component Lifetime Breakout Session (Audience Feedback)
EUV Source Modeling Workshop Summary
Project on EUV Source Development at MEXT, Japan
EUV Source Projects In Pre-Competitive Arena
Project List for Pre-Competitive Arena
SESSION IV
EUV Source Metrology	M. Schürmann
Workshop Summary	V. Bakshi
POSTERS
Tools for EUVL-Source Characterization and Optimization
Time-resolved pinhole imaging and spectroscopy on discharge sources of EUV radiation
Xenon Recirculation Systems for EUV Sources
ESH Assessment of EUV Lithography
Debris-free, low-cost, commercial EUV source for at-wavelength metrology
Factors influencing in-band radiant Yield
Laser heating of condensed Xe: EUV source efficiency considerations