EUVL Source Workshop

23 February 2003
Santa Clara, California

(All presentations are in .PDF format)

SESSION I - Robert Bristol, Chair

• Opening Remarks/Welcome - Vivek Bakshi, International SEMATECH
• EUVL Overview - Kevin Kemp, ISMT
• EUV Source Overview - Vivek Bakshi, ISMT
• Contamination Workshop Highlights - Obert Wood, ISMT
• EUV Source Requirements - Kazuya Ota, Nikon
• Cymer presentation - Igor Fomenkov
• EUVA presentation - Akira Endo
• EXULITE presentation - Bernard Fay
• Innolite presentation - Björn Hansson

SESSION II - Stefan Wurm, Chair

• JMAR presentation - Edmond Turcu
• Philips Extreme presentation - Joseph Pankert
• PLEX presentation - Malcolm McGeoch
• PowerLase presentation - Michael Egan
• NGST/CEO presentation - Stuart McNaught
• Xtreme Technology presentation - Uwe Stamm

SESSION III - Akira Endo, Chair

• EUV Source Metrology Roadmap - Max Schürmann, Jenoptik
• EUV Source Metrology Supplier Update - Fred Bijkerk, FOM Institute
• Tools for UEVL Source Characterization and Optimization - Max Christian Schurmann, JENOPTIK
• EUV Source Fund. Data Requirements - John Gillaspy, NIST
• EUV Source Critical Component Lifetime - Ahmed Hassanein, Argonne National Lab
• Condenser Optic Lifetime Issues - Bill Ballard, Sandia National Labs

SESSION IV - Joseph Pankert, Chair (Parallel Break-out Sessions)

• EUV Source Metrology - Max Schürmann
• Fundamental Data & Modeling Requirements - John Gillaspy
• EUV Source Critical Comp. Lifetime - Glenn Kubiak
• Meeting Highlights - Vivek Bakshi

SESSION V - Dick Moyer, Chair (Poster Session)

• Performance Evaluation on Discharge & Laser Based EUV Sources - Peter Choi/EPPRA
• Comparison of EUV Semiconductor Photodiode Sensors - Raj Korde/IRD
• Laser Heating of Noble Gas Droplet Sprays - S.J. McNaught/Univ. MD
• Coherent Short Wavelength Science - Margaret Murmane/JILA
• The Generation of EUV Light with a Compact ECR Plasma Source - Jani Reijonen/LBNL
• High-Accuracy Detector Calibration for EUV Metrology at PTB - Frank Scholze/PTB
• Multilayer Based Instrumentation Developments for EUVL Source Metrology - Leonid Shmaenok/PhysTex
• High Efficiency EUV Source from a Laser-Produced-Plasma of Tin-Targets - Edmond Turcu/JMAR
• 2-D Radiation Magneto-Hydro-Dynamic Simulations – Ken Ware/ER2S
• Charge state effects in mirror degradation - Laura Ratliff/NIST
• Setup and Initial Results of a Secondary Plasma-Based Debris Mitigation Technique for Use in EUV Sources – David Ruzic/Univ. of Illinois
• Plasma Effects on Condenser Optics in the Engineering Test Stand – Philip Grunow/Sandia National Labs
• Compact electron-based EUV source at 13.5nm - Andre Egbert/Laser Zentrum
• Metrology Tools for Characterization and Control of a Laser Plasma EUV Source Based on a Gas Puff Target – Henryk Fiedorowitz/Institute of Optoelectronics, Military University of Technology