EUV Mask Mechanical Fixturing in Write, Metrology, and Exposure Tools

07 March 2002
Santa Clara, California

Presented at the SPIE Microlithography Conference

(All presentations are in .PDF format)

• Detailed Meeting Minutes - P. Seidel (International SEMATECH)
• Introduction and Agenda - P. Mangat (Motorola)
• Summary of Technical Interchange (07/19/01 Meeting Output) - K. Blaedel (Lawrence Livermore National Laboratory)
• SEMI Standards Process and EUV Mask Chucking - S. Hector (Motorola)
• Chucking of EUVL Masks - R. Engelstad (University of Wisconsin)
• EUV Reticle Clamping in Exposure Tools, Reticle Writers and Reticle Inspection Equipment - S. Roux (ASML)
• Chucking of EUV Masks - F-M. Kamm (Infineon - Leica)