EUV Mask Development Seminar

04 March 2002
Santa Clara, California

Presented at the SPIE Microlithography Conference
 

(All presentations are in .PDF format)

• Detailed Meeting Minutes - Phil Seidel (ISMT)
• LTEM Substrates (polishing & metrology) - John Taylor (LLNL)
• Blank Multilayer Depositions (inspection, repair) - Don Sweeney (LLNL)
• Mask Patterning Process - Pei-Yang Yan (Intel)
• Mask Inspection & Defect Mitigation - Alan Stivers (Intel)
• Infineon EUV Mask Fabrication Frank - Michael Kamm (Infineon)
• Photronics / MCoC EUV Mask Patterning - Dave Walker (Photronics)
• EUV Mask Cost of Ownership - Scott Hector (Motorola)