EUV Lithography Source Workshop
03 March 2002
(All presentations are in .PDF format)
- Introduction
- Pat Gabella, International SEMATECH
- Manufacturers
EUVL Requirements - P. Silverman, Intel
- Scanner
Source Requirements - Rick Gontin, ASML
- Optimization of
a Dense Plasma Focus Device as a Light Source for EUV Lithography
- Igor Fomenkov, Cymer
- Laser-Produced
Plasma EUV Source Program - Richard Moyer, TRW
- Overview
of JMAR Laser-Plasma Source for EUV Lithography - Edmond Tercu,
JMAR
- Challenge
for EUV Light Source Technology - Hakaru Mizoguchi, Gigaphoton
- High
Power EUV Sources for Lithography - LaserUwe Stamm, Xtreme
- Hollow
Cathode Triggered Pinch Plasma Source for EUV Lithography - Joseph
Pankert, Philips
- Capillary
Discharge Source - Glenn Kubiak, Sandia National Lab
- Astron High Power EUV Source -
Malcolm McGeoch, Plex
- LPP
Liquid Xenon Jet EUV - Bert Junno, Innolite
- Plasma
based EUV sources: Where are the limits? Rainer Lebert, AIXUV
- Flying Circus 2, a concerted effort
a concerted effort in EUV source development - Fred Bijkerk,
FOM
- Meeting
Minutes