| Abstract |
A benefit/cost model for metrology in manufacturing |
James Potzick, NIST |
| Abstract |
The changing face of CD Metrology in Manufacturing: Design and Process Verification |
John L Sturtevant, Mentor Graphics Corp |
| Abstract |
A Mathematical Solution to Identify the Causes of Yield Degradation |
Jerome Lacaille, SI-Automation |
| Abstract |
Thin Film Metrology for 65nm Production |
Volker Kahlert, Ph.D. |
| Abstract |
Strategies to prevent yield loss in the next technology nodes |
Dieter Rathei, D R YIELD Software & Solutions |
| Abstract |
A Systematic Corrective Action Management System |
Bruce Whitefield, LSI Logic Corp. |
