Past Symposia:
2nd ISMI Symposium on Manufacturing Effectiveness

Session 3: Statistical Approaches to Resolving Yield and Metrology Issues

Chairs: Diane K. Michelson, Don McCormack

Abstract Implementation of Machine Learning for metrology applications in front-end manufacturing: spatial profile estimation and outlier profile detection Alegret Cyril, STMicroelectronics
Abstract On the Application of Machine Learning: is this a Boon or Bust? Chris Peterson, Intel
Abstract High volume statistical scan test analysis as enabler for yield learning Dr. Hans-Peter Erb, Infineon
Abstract Using GUIs for Yield Modeling and Data Mining Joel Dobsen, Texas Instruments
Abstract Stochastic Integration in Design Yield Analysis Ed Russell, Sun Microsystems, Inc.
Abstract Building Models in the Presence of Measurement Error Phillip Yates, Infineon

 

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