Past Symposia:
1st ISMI Symposium on Manufacturing Effectiveness

Session 7: Yield & Metrology
Ron Remke, Chair
 

Abstract   The Impact of New Process Control on Pattern Limited Yield: Enabling Technology Leaders to Become Low-Cost Producers Kevin Monahan, KLA Tencor
Abstract   Demystifying Design-for-Yield Laura Peters, Semiconductor International Magazine
Abstract   Establishing Competitive Semiconductor Manufacturing for 0.13um Copper Technology and Beyond John Allgair, Freescale (ISMI Assignee)
Abstract   Tool-level Data Analysis for Increased Efficiency and Process Control Andrew Skumanich, Applied Materials
Abstract Systematic Mechanisms Limited Yield: Trends, Practices and Challenges Robert Leachman, University of California, Berkeley


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