Past Symposia:
1st ISMI Symposium on Manufacturing Effectiveness

SESSION 6: Statistical Methods – Modeling and DOE
Diane K. Michelson and Donald W. McCormack, Chairs

Abstract D-Optimal Split Plot Designs   Brad Jones, JMP
Abstract Defects-based Yield Modeling in Semiconductor Manufacturing   Michael Baron (University of Texas, Dallas), Asya Takken (IBM), Mary Wisniewski (IBM) and Emmanuel Yashchin (IBM). Presented by Michael Baron, University of Texas
Abstract Modeling Distribution Networks Using Stochastic Simulation and Response Surface Models   Kurt Johnson & Michael Waithe (Intel). Presented by Kurt Johnson, Intel
Abstract   Process Improvement using a Response Surface Methodology Experiment (RSM) for Chemical Polish (CMP) Nonuniformity Reduction   Joel Dobson & Michael Lube, Texas Instruments. Presented by Joel Dobson, TI
Abstract   Selecting Sample Sizes or What the Books Don't Tell You   Kathryn Hall, HP
Abstract On the Use of Generalized P-Values to Test Variance Components   Diane K. Michelson, ISMI


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