5th ISMI Symposium on Manufacturing Effectiveness
Short Course: "Introductory Metrology"
Tuesday, October 21
1PM-5PM
Instructors: Benjamin Bunday, ISMI and George Orji, NIST
This 4-hour course will provide attendees with a basic working knowledge of the principles of metrology, including:
- General metrology and uncertainty concepts
- Instrumentation overview and applications
- Instrument evaluation procedures and test samples
- Reference measurement systems
- Metrology Best known methodologies (BKMs)
Although the course will emphasize CD metrology, the principles conveyed are applicable in a general sense to any metrology. The course will also include a brief overview of the highlights of the SEMATECH unified specifications for CD-SEM and scatterometry, and how they are used. Practical examples will be given during the course.
Attendees can expect to gain a better understanding of general definitions, methodologies and issues in metrology.
Participants will receive both printed and soft copies of the presentation materials.
Who Should Attend
This course is intended for engineers, technicians, technical managers, or anyone who wants to understand or review key metrology concepts and methodologies or applicability of different instruments.
About the Instructors
Benjamin Bunday, Senior Member Technical Staff, is the project manager of CD metrology at ISMI. For seven years he has led ISMI's and SEMATECH’s CD-SEM and OCD benchmarking, evaluation, and technology development efforts, and ISMI’s well-known Advanced CD Metrology Advisory Group (AMAG). Bunday has been the chief author of the AMAG unified CD-SEM and scatterometry specifications and is actively involved with the metrology chapter of the ITRS. He has 12 years of industry experience in the areas of CD metrology, lithography, and etch. A member of SPIE and the author or coauthor of over 50 papers, he received an MS in Materials Science and Engineering from Cornell University in Ithaca, NY.
George Orji is a member of the NIST technical staff, currently on assignment at SEMATECH. He works on applications of scanning probe microscopy techniques in semiconductor manufacturing. His interests are in nanoscale dimensional metrology, optical metrology, reference measurement systems, uncertainty analysis and standards development. He holds a PhD in mechanical engineering from the University of North Carolina at Charlotte. He is a member of SPIE and the American Society for Precision Engineering.
How to Register
You must register to attend this short course. There is a registration fee of $100 for ISMI Members; $250 for all others.
