04114596E-ENG Abstract: Unified Advanced Optical Critical Dimension (OCD) Scatterometry Specification for sub-65 nm Technology (2008 Version)

SEMATECH DOC ID #: 04114596E-ENG

Title: Unified Advanced Optical Critical Dimension (OCD) Scatterometry Specification for sub-65 nm Technology (2008 Version)

Author(s): Amir Azordegan;Benjamin Bunday;Bill Banke;Chas Archie;Eric Solecky;John Allgair;Richard Silver;

Document date: 01/16/2009

Descriptor(s): critical dimension;equipment specification;performance specification;scanning electron microscopes;scatterometers;

Abstract: This report from the LITG440M project (originally authored under
the SEMATECH LITG410 project) is a unified specification for
advanced optical critical dimension (OCD) scatterometry
measurement instruments developed by SEMATECH representatives.
This specification is intended for the scatterometry user and
supplier community as a whole. Its purpose is to specify member
companies' OCD tool requirements, set forth methodologies for
measuring various metrics for benchmarking and qualifying OCD
scatterometers, to drive suppliers to meet customers'
requirements and the International Technology Roadmap for
Semiconductors (ITRS). It is also a useful source for developing
in-house metrology practices, training new personnel, and guiding
the writing of acceptance specifications. This specification is a
"living document," designed for amendment to address future
technology nodes and issues. This version This version includes
the new 2007-2008 ITRS uncertainty definition and tables.

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