04114595E-ENG Abstract: Unified Advanced Critical Dimension Scanning Electron Microscope (CD-SEM) Specification for sub-90 nm Technology (2008 Version)

SEMATECH DOC ID #: 04114595E-ENG

Title: Unified Advanced Critical Dimension Scanning Electron Microscope (CD-SEM) Specification for sub-90 nm Technology (2008 Version)

Author(s): Amir Azordegan;Andras Vladar;Benjamin Bunday;Bhanwar Singh;Bill Banke;Carsten Hartig;Chas Archie;David Joy;Eric Solecky;Gary Cao;John Villarrubia;Michael Postek;

Document date: 01/16/2009

Descriptor(s): critical dimension;equipment specifications;performance specifications;scanning electron microscopes;

Abstract: This report from the LITG440M project is a unified specification
for advanced critical dimension scanning electron microscope (CD-
SEM) measurement instruments developed by International SEMATECH
Manufacturing Initiative (ISMI) and the National Institute of
Standards and Technology (NIST). This specification, intended for
the CD-SEM user and supplier community, represents the ISMI
member companies' consensus on CD-SEM requirements. It sets forth
methodologies for measuring various metrics for benchmarking and
qualifying CD-SEMs and for driving suppliers to meet customer
requirements and the International Technology Roadmap for
Semiconductors (ITRS). It is also a useful source for developing
in-house metrology practices, training new personnel, and
providing guidance for writing acceptance specifications. This
revision includes the new 2007-2008 ITRS uncertainty definition
and tables and an update on new understanding of photoresist
shrinkage.

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