04114595D-ENG Abstract: Unified Advanced Critical Dimension Scanning Electron Microscope (CD-SEM) Specification for sub-90 nm Technology (2007 Version)

SEMATECH DOC ID #: 04114595D-ENG

Title: Unified Advanced Critical Dimension Scanning Electron Microscope (CD-SEM) Specification for sub-90 nm Technology (2007 Version)

Author(s): Amir Azordegan;Andras Vladar;Benjamin Bunday;Bhanwar Singh;Bill Banke;Carsten Hartig;Chas Archie;David Joy;Eric Solecky;Gary Cao;John Villarrubia;Michael Postek;

Document date: 01/15/2008

Descriptor(s): scanning electron microscopes;critical dimension;equipment specifications;performance specifications;

Abstract: This report from the LITG440M project is a unified specification
for advanced critical dimension scanning electron microscope (CD-
SEM) measurement instruments developed by International SEMATECH
Manufacturing Initiative (ISMI) and the National Institute of
Standards and Technology (NIST). This specification, intended for
the CD-SEM user and supplier community, represents the ISMI
member companies' consensus on CD-SEM requirements. It sets forth
methodologies for measuring various metrics for benchmarking and
qualifying CD-SEMs and for driving suppliers to meet customer
requirements and the International Technology Roadmap for
Semiconductors (ITRS). It is also a useful source for developing
in-house metrology practices, training new personnel, and
providing guidance for writing acceptance specifications. This
revision includes updates to precision, matching, and resolution.
This revision includes additions to throughput, discussions about
challenges to CD-SEM posed by the advent of contour metrology and
double patterning, a new section about fleet management and
recipe portability, and a discussion of uncertainly and sampling
error.

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