SEMATECH DOC ID #: 00104014A-TR

Title: Optical Lithography Cost of Ownership (COO) - Final Report for LITG501

Author(s): Ed Muzio;

Document date: 10/19/2000

Descriptor(s): cost modeling;cost of ownership;lithography;masks;throughput;

Abstract:  This final report from the LITG501 project presents an overview of the
results of the latest formal revision of the lithography cost of ownership
(COO) model, which compares costs of competing technologies without bias.
This report focuses on the four principal drivers of the final COO results:
mask usage, mask cost, tool throughput, and tool cost. For manufacturers with
low mask usage, the mask write step is the biggest driver of wafer-level COO.
Manufacturers with high mask usage should concentrate improvement efforts on
tool throughput and tool cost. Costs will continue to be driven upwards when
changing to 300 mm wafers.

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