SEMATECH DOC ID #: 99123857B-ENG

Title: Unified Equipment Performance Metrics for 130 nm Technology, Version 2.0

Author(s): Hisakazu Miyatake;Kiyoshi Kishimoto;Paul Patruno;

Document date: 07/06/2000

Descriptor(s): 300 mm wafers;equipment performance;cost of ownership;0.13 micron;wafer size conversion;

Abstract:  The Unified Equipment Performance Metrics for 130 nm Technology represents
consensus between International SEMATECH, Selete, and their respective member
companies. All of the forty equipment types discussed by International
SEMATECH and Selete now have unified metrics which represent the 2002
production standard. Values for defects have been agreed upon using 200 nm
and 65 nm/90 nm defect sizes. Cost Resource Model and data have been aligned.
A supplier is expected to comply with demonstrating equipment performance to
metrics.

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