SEMATECH DOC ID #: 97013229A-TR

Title: Evaluation of Air Liquide's Perfluorocompound (PFC) Capture Technology (ESHC002)

Author(s): Bill Cummins;Kevin Trilli;Michell Richards;Susrut Kesari;Tina Gilliland;

Document date: 02/17/1997

Descriptor(s): perfluorocompounds;emissions;quadrupole mass spectrometers;chamber cleaning;plasma chemical vapor deposition;design of experiments;pollution control equipment;

Abstract:  This report presents the results of an evaluation of an Air Liquide prototype
unit designed to recover perfluorocompounds (PFCs) from the exhaust of wafer
etch tools and plasma enhanced chemical vapor deposition (PECVD) chamber
cleans. The purpose was to determine if the prototype unit could capture the
five most commonly used PFCs (C2F6, CF4, NF3, SF6, and CHF3) with a capture
efficiency of 90+% and a concentration of 90+%. A quadrupole mass
spectrometer (QMS) was used to analyze inlet and outlet gas streams. The test
results include a mass balance of 95+% performed around the prototype unit.
Additionally, tool PFC utilization efficiencies and byproducts were
quantified.