SEMATECH DOC ID #: 96123221A-ENG
Title: Evaluation of a MEGASORB Pressure Swing Adsorption (PSA) Unit Designed to Capture Perfluorocompounds (PFCs) (ESHC002A)
Author(s): Bob Ridgeway;Greg Behrens;Kim Christian;Michelle Richards;Tina Gilliland;Tom Hall;Will Culp;
Document date: 01/02/1997
Descriptor(s): Fourier transform infrared spectroscopy;perfluorocompounds;pollution control equipment;adsorption;plasma chemical vapor deposition;etching equipment;chamber cleaning;quadrupole mass spectrometers;
Abstract:
This report presents the results of an evaluation of a prototype Air
Products/Radian International MEGASORB pressure swing adsorption (PSA) system
designed to recover perfluorocompounds (PFCs) from the exhaust of wafer etch
tools and plasma-enhanced chemical vapor deposition (PECVD) chamber cleans.
The purpose was to determine if the PSA if the PSA could capture the five most
commonly used PFCs (C2F6, CF4, NF3, SF6, and CHF3) with a recovery efficiency
of 90+%. A quadrupole mass spectrometer (QMS) and a Fourier transform
infrared (FTIR) spectrometer were used to analyze gas phase effluents.
© Copyright 2008 SEMATECH, Inc.
Please read these important Trademark and legal notices