SEMATECH DOC ID #: 96093181A-ENG
Title: Advanced Process Control Framework Initiative (APCFI) Proposal Summary and Plan
Author(s): Alan Weber;Anoop Mathur;Anthony Toprak;Carla Jobe Partington;David Bennet;Jim Orrock;John Christoffel;Kara Krause;Michael Greig;Mike Barrett;Steve Nettles;Sue Gaskill;
Document date: 10/03/1996
Descriptor(s): advanced process control;cim;equipment modeling;factory modeling;frameworks;interoperability standards;object oriented systems;process control;sensors;statistical process control;
Abstract:
This document contains most of a written proposal for a project called the
Advanced Process Control Framework Initiative (APCFI) (MSDC002). The project
proposal, which was submitted in September 1995 by AMD, Honeywell, and
SEMATECH to the Advanced Technology Program (ATP) of the National Institute
of Standards and Technology (NIST), resulted in a $5 million award to AMD and
Honeywell. The purpose of the project is to address the need for advanced
factory-level process control in the semiconductor industry by developing and
validating an open architecture (based on the SEMATECH Computed Integrated
Manufacturing [CIM] Framework) that enables model-based process control
applications to be integrated with current and future generations of
production control systems. The edited proposal is reproduced in this
document substantially as it was submitted to NIST, in the belief it will
benefit SEMATECH members, suppliers, and other industry participants in at
least two ways: (1) by providing an overview of the project's objectives and
scope as originally proposed to NIST; and (2) by setting an example of a
successful proposal to NIST's ATP Office. In constructing this document,
SEMATECH has deleted or modified portions of the original proposal to protect
confidential technical and financial information of the participants. The
technical approach and schedule have been refined significantly during the
year, so readers should consult subsequent deliverables from this project for
the most current information in these areas.
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