SEMATECH DOC ID #: 95123039A-TR
Title: S68 Final Report: Template Methodology and Lessons Learned for Sampling and Analyzing Tool Effluents
Author(s): Eugene O'Donnell;G. Dean Marbury;John S. Stanley;Lance M. Henning;Melissa D. Tucker;
Document date: 01/04/1996
Descriptor(s): calibration;chemical vapor deposition;emissions;Fourier transform infrared spectroscopy;plasma etching;gauge capability;by-product characterization;spectrometry;employee safety;
Abstract:
This template methodology provides guidance for the construction,
verification, and operation of sampling and analysis systems to characterize
and quantitate semiconductor plasma manufacturing tool effluents after the
ballast gas is added, but before house abatement systems. The results
represent qualitative values for tool emissions upstream of abatement
devices; they do not represent emissions from the facility. The methodologies
have been applied to several plasma etch and chemical vapor deposition (CVD)
processes and are based on the application of online configurations of mass
spectrometry (MS) and Fourier transform infrared (FTIR) spectrometry to
monitor representative samples of gaseous tool effluents. Lessons learned
pertain to sampling manifold design and construction; instrument calibration
and quality control (QC); and data collection, storage, and analysis. This
document is meant to serve as a knowledge base to be built as investigations
in this area continue.
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